论文信息 - Surface relief diffraction gratings fabricated in ZnSe by frequency doubled Nd:YAG laser micromachining

Surface relief diffraction gratings fabricated in ZnSe by frequency doubled Nd:YAG laser micromachining

A novel and rapid laser ablation method for the fabrication of diffractive optical elements (DOE) in ZnSe that takes advantage of the relatively low intensity damage threshold of the material is presented. The structures were characterized in terms of their shape and diffraction efficiency at normal incidence under 10.6 μm radiation for TE and TM polarizations. Sample surface polishing as well as the possible effect of the melted zone and structural modification of the material around the ablated region on the power transmission capability of the grating are also discussed.

[1] Don A. Lucca,et al. Assessment of subsurface damage in polished II-VI semiconductors by ion channeling , 2004 .

[2] T. Taguchi,et al. AFM and photoluminescence characterization of defects in the mirror-polished ZnSe bulk crystals and MBE-grown homoepitaxial layers , 2000 .

[3] Fengzhou Fang,et al. Diamond Turning of Soft Semiconductors to Obtain Nanometric Mirror Surfaces , 2002 .

[4] M. Moharam,et al. Limits of scalar diffraction theory for diffractive phase elements , 1994 .

[5] V. A. Gnatyuk,et al. Mechanism of laser damage of transparent semiconductors , 2001 .

[6] E. Loewen,et al. Diffraction Gratings and Applications , 2018 .

[7] D. Day,et al. Femtosecond fabricated photomasks for fabrication of microfluidic devices. , 2006, Optics express.

[8] J. Mahan,et al. Novel wet chemical etch for nanostructures based on II-VI compounds , 1997 .

[9] Gregg T. Borek,et al. Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide , 2003, SPIE MOEMS-MEMS.