Loose abrasive blasting as an alternative to slurry polishing of optical fibre end faces

Abstract A novel method of polishing the end face of an optical fibre by blasting it with loose dry abrasive grit travelling at high speeds is presented. The method, called loose abrasive blasting (LAB), is specifically designed to improve the surface quality of micro-lenses ground at the tips of optical fibres. Thus, the method described is suitable for polishing non-flat surfaces. Blasting is carried out by immersing the fibre tip in a stream of high kinetic energy abrasive grit. The surface finish attainable using LAB is compared with that of cleaved, ground and slurry polished fibre end faces. Optical microscopy photographs are presented as a qualitative comparison. The surface roughnesses are measured using atomic force microscopy (AFM). For cleaved fibres, the surface roughness improved by a factor of 2 and 6 for slurry polished and dry diamond blasted fibres, respectively.

[1]  D. Golini,et al.  Physics of loose abrasive microgrinding. , 1991, Applied optics.

[2]  Brigid Mullany,et al.  The effect of slurry viscosity on chemical–mechanical polishing of silicon wafers , 2003 .

[3]  K. Zimmer Etching of fused silica and glass with excimer laser at 351 nm , 2003 .

[4]  Rahul Jairath,et al.  Effect of Polishing Pad Material Properties on Chemical Mechanical Polishing (Cmp) Processes , 1994 .

[5]  J. Bennett,et al.  Float polishing of optical materials. , 1987, Applied optics.

[6]  S. Kanzaki,et al.  Material response to particle impact during abrasive jet machining of alumina ceramics , 2003 .

[7]  S. Babu,et al.  The use of monodispersed colloids in the polishing of copper and tantalum. , 2003, Journal of Colloid and Interface Science.

[8]  Michael Curt Elwenspoek,et al.  Reduction of sidewall inclination and blast lag of powder blasted channels , 2002 .

[9]  Shih-Chieh Lin,et al.  A study of the effects of polishing parameters on material removal rate and non-uniformity , 2002 .

[10]  Shen Dong,et al.  Ultraprecision grinding machining of optical aspheric surface in ductile mode , 2001, Optics + Photonics.

[11]  D Milam,et al.  Carbon dioxide laser polishing of fused silica surfaces for increased laser-damage resistance at 1064 nm. , 1982, Applied optics.

[12]  Determination of surface roughness from scattered light , 1989, Digest on Antennas and Propagation Society International Symposium.

[13]  Bau-Tong Dai,et al.  Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films , 1996 .

[14]  Fang Wang,et al.  Investigation on the final polishing slurry and technique of silicon substrate in ULSI , 2003 .

[15]  M. Manfra,et al.  Hydroplane polishing of semiconductor crystals , 1981 .

[16]  Nobuo Yasunaga,et al.  Mechanochemical Polishing of Si Single Crystals with Soft Powders , 1978 .