Atomic layer deposition: an overview.

[1]  H. Fjellvåg,et al.  Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films , 2007 .

[2]  John C. Hecker Scientific Foundations of Vacuum Technique. , 1962 .

[3]  스네오퍼 Ald apparatus and method , 2003 .

[4]  Pekka Soininen,et al.  Growth of titanium dioxide thin films by atomic layer epitaxy , 1993 .

[5]  S. George,et al.  Tungsten atomic layer deposition on polymers , 2008 .

[6]  S. George,et al.  Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings , 2008 .

[7]  Steven M. George,et al.  Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3 , 2003 .

[8]  Steven M. George,et al.  Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates , 2002 .

[9]  Alan W. Weimer,et al.  Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles , 2000 .

[10]  M. Pessa,et al.  A study of ZnTe films grown on glass substrates using an atomic layer evaporation method , 1980 .

[11]  Thomas E. Seidel,et al.  Thin film atomic layer deposition equipment for semiconductor processing , 2002 .

[12]  Steven M. George,et al.  Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6 , 2005 .

[13]  Tetsuzo Yoshimura,et al.  Selective growth of conjugated polymer thin films by the vapor deposition polymerization , 2006 .

[14]  닐슨 오라,et al.  Thin films prepared with gas phase deposition technique , 2005 .

[15]  S. George,et al.  Nucleation and growth during the atomic layer deposition of W on Al2O3 and Al2O3 on W , 2004 .

[16]  J. Gilman,et al.  Nanotechnology , 2001 .

[17]  S. George,et al.  Nucleation and growth during tungsten atomic layer deposition on SiO2 surfaces , 2001 .

[18]  P. O’Brien,et al.  Atomic Layer Epitaxy , 2008 .

[19]  M. Ferenets,et al.  Thin Solid Films , 2010 .