Annealing and Impurity Effects in Co Thin Films for MOL Contact and BEOL Metallization
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B. Haran | B. Peethala | J. Demarest | M. Raymond | M. Hopstaken | J. Kelly | V. Kamineni | H. Shobha | X. Lin | A. Pacquette | Y. Liang | H. Amanapu | L. Jiang | J. Kelly