Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
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L. Pain | R. Tiron | P. Pimenta-Barros | C. Comboroure | N. Allouti | C. Nicolet | G. Chamiot-Maitral | N. Posseme | G. Claveau | M. Argoud | Z. Chalupa | C. Navarro | I. Cayrefourcq | M. Argoud | I. Cayrefourcq | N. Possémé | L. Pain | R. Tiron | N. Allouti | C. Navarro | G. Chamiot-Maitral | C. Nicolet | P. Pimenta-Barros | G. Claveau | Z. Chalupa | C. Comboroure
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