Temporally Opaque Arguments in Verbs of Creation

A heat shield of pyrolytic graphite is deposited around the peripheries of silicon wafers in chemical-vapor-deposition apparatus of the type wherein the wafers are heated and epitaxial layers of silicon are deposited upon the surfaces of the heated wafers. The wafers and the heat shield are disposed on a susceptor of conventional graphite. The heat shield has a C-axis along which heat conductivity is relatively much lower than in the wafers and in the susceptor, and the C-axis is disposed perpendicularly to the susceptor, whereby most of the silicon is deposited onto the wafers.

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