Nucleation and Growth Behavior of Atomic Layer Deposited HfO2 Films on Silicon Oxide Starting Surfaces
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M. Heyns | T. Conard | A. Delabie | L. Nyns | S. Gendt | C. Vinckier | S. Elshocht | W. Deweerd | L. Hall | N. V. Hoornick | Thierry Conard