Efficient and rigorous three-dimensional model for optical lithography simulation
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[1] Richard A. Ferguson,et al. Some image modeling issues for I-line, 5X phase-shifting masks , 1994, Advanced Lithography.
[2] D. Nyyssonen. Theory of optical edge detection and imaging of thick layers , 1982 .
[3] C.-M. Yuan,et al. Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography , 1992 .
[4] Kevin D. Lucas,et al. Rigorous and practical vector model for phase-shifting masks in optical lithography , 1992, Advanced Lithography.
[5] Andrew R. Neureuther,et al. Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation , 1995, Advanced Lithography.
[6] C. Burckhardt. Diffraction of a Plane Wave at a Sinusoidally Stratified Dielectric Grating , 1966 .
[7] K. Lucas,et al. A new vector 2D photolithography simulation tool , 1992, 1992 International Technical Digest on Electron Devices Meeting.
[8] Andrew R. Neureuther,et al. Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation , 1994, Advanced Lithography.
[9] Hiroyoshi Tanabe,et al. Modeling of optical images in resists by vector potentials , 1992, Advanced Lithography.
[10] Kevin D. Lucas,et al. Efficient 3D phase-shifting mask lithography simulation , 1995, Advanced Lithography.
[11] Andrew W. Neureuther. Understanding Lithography Technology Issues through Simulation , 1993 .
[12] Andrew R. Neureuther,et al. Three-dimensional simulation of optical lithography , 1991, Other Conferences.
[13] Andrzej J. Strojwas,et al. Modeling optical microscope images of integrated circuit structures , 1991 .
[14] Qi-De Qian,et al. Laser alignment modeling using rigorous numerical simulations , 1991, Other Conferences.
[15] Derek B. Dove,et al. New mask evaluation tool: the microlithography simulation microscope aerial image measurement system , 1994, Advanced Lithography.
[16] D. A. Dunnett. Classical Electrodynamics , 2020, Nature.
[17] C. P. Kirk,et al. Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory , 1988 .
[18] Burn Jeng Lin. The Paths To Subhalf-Micrometer Optical Lithography , 1988, Advanced Lithography.
[19] F. Kaspar,et al. Diffraction by thick, periodically stratified gratings with complex dielectric constant , 1973 .