Study of SiNx thin film character with gas flow rate in PECVD
暂无分享,去创建一个
[1] Tong-Yi Zhang,et al. The testing method of mechanical properties of thin films , 2001 .
[2] Yoshihiro Kurata,et al. Effects of active hydrogen on the stress relaxation of amorphous SiNx:H films , 1994 .
[3] Gunnar Suchaneck,et al. Low-temperature PECVD-deposited silicon nitride thin films for sensor applications , 2001 .
[4] He,et al. Analysis of SiH and SiN vibrational absorption in amorphous SiNx:H films in terms of a charge-transfer model. , 1993, Physical review. B, Condensed matter.
[5] John Robertson,et al. Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition , 2001 .
[6] M. Quirk,et al. Semiconductor manufacturing technology , 2000 .
[7] P. Luo,et al. Growth and characterization of silicon nitride films on various underlying materials , 2002 .