Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions
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N. Gavrilov | K. Sobczak | R. Ratajczak | I. Demchenko | Y. Melikhov | M. Sawicki | E. Dynowska | R. Minikaev | A. Barcz | M. Walczak | Y. Syryanyy | M. Chernyshova | J. Domagała | R. Minikaev