Structural Analysis of Si(OEt)4 Deposits on Au(111)/SiO2 Substrates at Nanometer Scale using Focused Electron Beam Induced Deposition

The focused electron beam induced deposition (FEBID) process was used by employing a Gemini SEM with a beam characteristic of 1keV and 24pA for the deposition of pillars and line shaped deposits with heights between 9nm to 1µm and widths from 5nm to 0.5µm. All structures have been analysed to their composition looking at a desired Si : O : C content of 1: 2 : 0. The C content of the structure was found to be ~over 60% for older deposits kept in air (~at room temperature) and less than 50% for younger deposits, only 12 hours old. Using a deposition of Si(OEt) 4 at high rates and a deposition temperature of under 0 degC, an Si content of our structure between 10at% and 15at% (compositional percentage) was obtained. The FEBID structures have been deposited on Au(111) over an SiO 2 wafer. The Au(111) was chosen as a substrate for the deposition of Si(OEt) 4 due to its structural and morphological properties, with its surface granulation following a Chevron pattern, and the Au(111) defects having a higher contribution to the change in the composition of the final content of the structure with the increase in O ratio and a reduction in the shapes heights.

[1]  I. Al-Momani,et al.  Encapsulation of 4,4,4-trifluoro-1-(2-thienyl)-1,3-butanedione into the silica gel matrix for capturing uranium(VI) ion species , 2021, Journal of Radioanalytical and Nuclear Chemistry.

[2]  Bingbing Jiang,et al.  Nanoplatform based on GSH-responsive mesoporous silica nanoparticles for cancer therapy and mitochondrial targeted imaging , 2021, Microchimica Acta.

[3]  Karina M. M. Carneiro,et al.  DNA nanostructures as templates for biomineralization , 2021, Nature Reviews Chemistry.

[4]  S. Furukawa,et al.  Silica‐Decoration Boosts Ni Catalysis for (De)hydrogenation: Step‐Abundant Nanostructures Stabilized by Silica , 2021 .

[5]  P. Leray,et al.  Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography , 2020, IEEE Transactions on Semiconductor Manufacturing.

[6]  P. Rack,et al.  Focused Electron Beam-Based 3D Nanoprinting for Scanning Probe Microscopy: A Review , 2019, Micromachines.

[7]  E. Yoon,et al.  Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas , 2019 .

[8]  Hiroki Miyai,et al.  Actinic patterned mask defect inspection for EUV lithography , 2019, Photomask Technology.

[9]  A. Yen,et al.  Enabling manufacturing of sub-10nm generations of integrated circuits with EUV lithography , 2019, 2019 Electron Devices Technology and Manufacturing Conference (EDTM).

[10]  A. Maximov,et al.  Dendrimer‐Encapsulated Pd Nanoparticles, Immobilized in Silica Pores, as Catalysts for Selective Hydrogenation of Unsaturated Compounds , 2019, ChemistryOpen.

[11]  H. Nguyen,et al.  One-pot synthesis of SiO2‒CeO2 nanoparticle composites with enhanced heat tolerance , 2019, Microporous and Mesoporous Materials.

[12]  A. Yen,et al.  EUV Lithography at Threshold of High-Volume Manufacturing* , 2018, International Electron Devices Meeting.

[13]  M. Kiuchi,et al.  Low-energy mass-selected ion beam production of fragments from tetraethylorthosilicate for the formation of silicon dioxide film , 2018 .

[14]  S. Barth,et al.  Electron Induced Surface Reactions of HFeCo3(CO)12, a Bimetallic Precursor for Focused Electron Beam Induced Deposition (FEBID) , 2018 .

[15]  M. Huth,et al.  Focused electron beam induced deposition meets materials science , 2017, 1709.05835.

[16]  M. Ibarra,et al.  Review of magnetic nanostructures grown by focused electron beam induced deposition (FEBID) , 2016 .

[17]  D. Fairbrother,et al.  The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors , 2015, Beilstein journal of nanotechnology.

[18]  A. Szkudlarek,et al.  Continuum models of focused electron beam induced processing , 2015, Beilstein journal of nanotechnology.

[19]  G. Bordonaro.  DUV Photolithography and Materials , 2015 .

[20]  Nicholas W M Ritchie,et al.  Performing elemental microanalysis with high accuracy and high precision by scanning electron microscopy/silicon drift detector energy-dispersive X-ray spectrometry (SEM/SDD-EDS) , 2014, Journal of Materials Science.

[21]  Thomas Scheruebl,et al.  Defect mitigation considerations for EUV photomasks , 2014 .

[22]  A. Kummel,et al.  Synthesis and surface functionalization of silica nanoparticles for nanomedicine. , 2014, Surface science reports.

[23]  P. Rack,et al.  Rapid and Highly Compact Purification for Focused Electron Beam Induced Deposits: A Low Temperature Approach Using Electron Stimulated H2O Reactions , 2014 .

[24]  F. Hanke,et al.  Structure and local reactivity of the Au(111) surface reconstruction , 2013 .

[25]  Michael Huth,et al.  Focused electron beam induced deposition: A perspective , 2012, Beilstein journal of nanotechnology.

[26]  R. Jonckheere,et al.  Improving extreme UV lithography mask repair , 2012 .

[27]  Dominique Drouin,et al.  Three-dimensional electron microscopy simulation with the CASINO Monte Carlo software. , 2011, Scanning.

[28]  G. Ozin,et al.  Periodic mesoporous hydridosilica--synthesis of an "impossible" material and its thermal transformation into brightly photoluminescent periodic mesoporous nanocrystal silicon-silica composite. , 2011, Journal of the American Chemical Society.

[29]  L. Belova,et al.  Electron beam induced deposition at elevated temperatures: compositional changes and purity improvement , 2011, Nanotechnology.

[30]  M. Donath,et al.  Growth and morphology of thin Fe films on flat and vicinal Au(111): a comparative study , 2009 .

[31]  E. Kaxiras,et al.  Atomic Oxygen Adsorption on Au(111) Surfaces with Defects , 2009 .

[32]  U. Gösele,et al.  A practical, self-catalytic, atomic layer deposition of silicon dioxide. , 2008, Angewandte Chemie.

[33]  Dominique Drouin,et al.  CASINO V2.42: a fast and easy-to-use modeling tool for scanning electron microscopy and microanalysis users. , 2007, Scanning.

[34]  P. Rack,et al.  Focused, Nanoscale Electron-Beam-Induced Deposition and Etching , 2006 .

[35]  R. Egerton.  Physical Principles of Electron Microscopy: An Introduction to TEM, SEM, and AEM , 2010 .

[36]  Jason D. Fowlkes,et al.  Effects of heat generation during electron-beam-induced deposition of nanostructures , 2005 .

[37]  Mark Ma,et al.  A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography , 2005, IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005..

[38]  Peter P. Longo,et al.  High resolution material ablation and deposition with femtosecond lasers and applications to photomask repair , 2004 .

[39]  Vishal Garg,et al.  DUV laser lithography for photomask fabrication , 2004, SPIE Advanced Lithography.

[40]  A. Walcarius,et al.  Electro-assisted generation of functionalized silica films on gold , 2003 .

[41]  G. D. Price,et al.  Molecular dynamics simulation of liquid H2O, MeOH, EtOH, Si(OMe)(4), and Si(OEt)(4), as a function of temperature and pressure , 2001 .

[42]  Traldi,et al.  Electrospray ionization in the study of polycondensation of Si(OEt)(4) , 1999, Journal of mass spectrometry : JMS.

[43]  Y. Shani,et al.  Near‐field optical photomask repair with a femtosecond laser , 1999, Journal of microscopy.

[44]  C. Pilon,et al.  Porosity of Sol-Gel Derived Silica Coatings on Glass Substrates , 1998 .

[45]  Young-Joo Eo,et al.  Coating of Tetraethylorthosilicate (TEOS)/Vinyltriethoxysilane (VTES) Hybrid Solution on Polymer Films , 1998 .

[46]  F. Rubio,et al.  A FT-IR Study of the Hydrolysis of Tetraethylorthosilicate (TEOS). , 1998 .

[47]  Haftel.  Surface reconstruction of platinum and gold and the embedded-atom model. , 1993, Physical review. B, Condensed matter.

[48]  Chan,et al.  Au(111): A theoretical study of the surface reconstruction and the surface electronic structure. , 1991, Physical review. B, Condensed matter.

[49]  J. White,et al.  Ultra-high vacuum preparation and characterization of ultra-thin layers of SiO2 on ZrO2 and TiO2 by chemical vapour deposition of Si(OEt)4 , 1987 .

[50]  M. Oprysko,et al.  Visible-laser repair of clear defects in photomasks , 1985, IEEE Electron Device Letters.

[51]  R. Maclagan,et al.  Valence-bond studies on SiH3 , 1984 .