On the E - H mode transition in RF inductive discharges
暂无分享,去创建一个
[1] H. Deutsch,et al. Electron kinetics of weakly ionized HF plasmas. I - Direct treatment and Fourier expansion , 1984 .
[2] U. Kortshagen,et al. Spatial variation of the electron distribution function in a rf inductively coupled plasma: Experimental and theoretical study , 1994 .
[3] C. Gabriel,et al. Gate oxide damage in a high density inductively coupled plasma , 1994 .
[4] J. Lawler,et al. CH3 and CH Densities in a Diamond Growth DC Discharge , 1995 .
[5] Maher I. Boulos,et al. Thermal Plasmas: Fundamentals and Applications , 1994 .
[6] P. Fauchais,et al. Thermal plasmas , 1997 .
[7] K. Chandrakar. The transition from the first to the second stage of the ring discharge , 1978 .
[8] L. Tsendin. Electron kinetics in non-uniform glow discharge plasmas , 1995 .
[9] Irene A. Stegun,et al. Handbook of Mathematical Functions. , 1966 .
[10] U. Kortshagen,et al. Electron energy distribution function in a microwave discharge created by propagating surface waves , 1994 .
[11] Benjamin Alexandrovich,et al. Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge , 1994 .
[12] Tsendin,et al. Experimental investigation and fast two-dimensional self-consistent kinetic modeling of a low-pressure inductively coupled rf discharge. , 1995, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[13] Frank Bose,et al. Application of a high density inductively coupled plasma reactor to polysilicon etching , 1993 .
[14] U. Kortshagen,et al. On the influence of metastable atoms on surface-wave produced helium plasmas , 1994 .
[15] J. Thomson. CI.The electrodeless discharge through gases , 1927 .
[16] J. H. Ingold,et al. Absorption spectroscopy on Hg + and excited Hg in Hg-Ar discharges , 1990 .
[17] J. Loureiro,et al. Electron energy distributions and excitation rates in high-frequency argon discharges , 1983 .
[18] Benjamin Alexandrovich,et al. A simple analysis of an inductive RF discharge , 1992 .
[19] W. Runciman,et al. The optical absorption of divalent chromium in CrCl2. 4H2O and CrSO4. 7H2O , 1963 .
[20] M. Moisan,et al. The similarity laws for the maintenance field and the absorbed power per electron in low-pressure surface wave produced plasmas and their extension to HF plasmas in general , 1988 .
[21] H. Maciel,et al. High‐density plasma mode of an inductively coupled radio frequency discharge , 1991 .
[22] Aliev,et al. Modeling of microwave discharges in the presence of plasma resonances. , 1995, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[23] J. Loureiro,et al. Effects of electron-electron collisions on the characteristics of DC and microwave discharges in argon at low pressures , 1992 .
[24] Wolfgang Hackbusch,et al. Multi-grid methods and applications , 1985, Springer series in computational mathematics.
[25] J. Forster,et al. Novel radio‐frequency induction plasma processing techniques , 1993 .
[26] V. Kolobov,et al. Nonlocal electron kinetics in a low‐pressure inductively coupled radio‐frequency discharge , 1994 .
[27] U. Kortshagen,et al. On the influence of excited atoms on the electron kinetics of a surface wave sustained argon plasma , 1994 .
[28] D. C. Gates,et al. Transformer coupled plasma etch technology for the fabrication of subhalf micron structures , 1993 .
[29] D. O. Wharmby,et al. Electrodeless lamps for lighting: a review , 1993 .
[30] Jeffrey Hopwood,et al. Review of inductively coupled plasmas for plasma processing , 1992 .
[31] J. Townsend,et al. XVI. Electrodeless discharges , 1928 .
[32] K. A. MacKinnon. LXVI. On the origin of the electrodeless discharge , 1929 .
[33] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .