论文信息 - High-Etching-Selectivity Barrier SiC (k<3.5) Film for 32-nm-Node Copper/Low-k Interconnects - 字舞流文

High-Etching-Selectivity Barrier SiC (k<3.5) Film for 32-nm-Node Copper/Low-k Interconnects

S. Saito | S. Kondo | N. Oda | S. Chikaki | Y. Ohashi | H. Shimizu | A. Gawase | S. Nagano | S. Hasaka | J. Nakahira