EUV-mask pattern inspection using current DUV reticle inspection tool
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Naoya Hayashi | Hiroshi Mohri | Shiho Sasaki | Akiko Fujii | Tsukasa Abe | Yasushi Sato | Hidemichi Imai | Hironobu Takaya | Yumiko Maenaka
[1] Do-Young Kim,et al. EUV mask pattern inspection for memory mask fabrication in 45-nm node and below , 2006, SPIE Photomask Technology.