论文信息 - ULTRAHIGH VACUUM REFLECTOMETER FOR USE WITH EXTREME ULTRAVIOLET SYNCHROTRON RADIATION.

ULTRAHIGH VACUUM REFLECTOMETER FOR USE WITH EXTREME ULTRAVIOLET SYNCHROTRON RADIATION.

An ultrahigh vacuum reflectometer is described. It can be used to study reflectance, transmittance, and photoemission on samples evaporated in situ. The angle of incidence can be varied from 0 to ±90° in steps of 7.5°. The system rotates about the axis of the incident light for study of polarization effects. With the polarized continuum of synchrotron radiation and a normal‐incidence monochromator the reflectometer allows measurements with polarized light at wavelengths down to about 300 A.

B. Feuerbacher | M. Skibowski | R. Godwin

[1] B. Feuerbacher,et al. Optical Constants of Germanium in the Region of the M 4,5 Edge* , 1968 .

[2] B. Feuerbacher,et al. Investigations of aluminum films with synchrotron radiation of wavelengths 500 to 1000 Å , 1968 .

[3] B. Feuerbacher,et al. Plasma resonance in the reflection spectrum of thin aluminium films , 1968 .

[4] E. Arakawa,et al. Angle‐Doubler for Reflectance Measurements in Evacuated Systems , 1968 .

[5] B. Feuerbacher,et al. Effect of Oxidation on the Photocurrent from an Al Film Irradiated with Polarized Light near the Plasma Wavelength , 1968 .

[6] M. Skibowski,et al. Normal-Incidence Monochromator for the Vacuum Ultraviolet Radiation from an Electron Synchrotron* , 1967 .

[7] D. Gerstenberg,et al. Physics of Thin Films , 1964 .