Modeling study of image formation with point sources
暂无分享,去创建一个
It is well known that a point source produces a small magnification of the mask pattern on the wafer due to divergence; the effect becomes especially noticeable at the corners and edges of the field. In this article we model the image formation due to a point source and compare the deviations of the aerial images and developed patterns, from those at the center of the field. We illustrate the behavior with several computational results.