SUPREM III Application

SUPREM III has emerged as the most widely used process simulator. The authors of SUPREM III have attempted to include the most up-to-date physically based process models that are currently available and suitable for computer simulation. Innumerable research hours have gone into the development of the various models and fitting parameters. However a silicon process, whether it is bipolar, NMOS, or CMOS, is an extremely complicated entity. There are several problems inherent in the SUPREM process models.

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