Developing a systematic approach to metal gates and high-k dielectrics in future-generation CMOS
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Prashant Majhi | Huang-Chun Wen | Husam N. Alshareef | H. Rusty Harris | Hongfa Luan | Kisik Choi | Chanro Park | Seung Chul Song | Byoung Hun Lee | Raj Jammy | B. Lee | P. Majhi | R. Jammy | Chanro Park | S. Song | H. Alshareef | H. Harris | H. Wen | K. Choi | H. Luan