A capacitor-over-bit-line (COB) cell with a hemispherical-grain storage node for 64 Mb DRAMs
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Takamaro Kikkawa | Naoki Kasai | Masato Sakao | Hirohito Watanabe | T. Ishijima | Eiji Ikawa | K. Terada | T. Kikkawa | N. Kasai | Hirohito Watanabe | E. Ikawa | M. Sakao | T. Ishijima | K. Terada
[1] P.C. Fazan,et al. Thin nitride films on textured polysilicon to increase multimegabit DRAM cell charge capacity , 1990, IEEE Electron Device Letters.