A recent new class of resists referred to as polymer-bound PAG resists, which have slightly increased PAG loading and reduced photo acid diffusion relative to tranditional blended CAR systems have shown promise in improving resolution, faster photospeed, higher stablility and LER. we have developed two kinds of PAG, which are cationic and anionic polymerizable PAGs. One is that the polymer backbone is directly connected with cationic part in PAG and the other is that the polymer backbone is directly connected with anionic part in PAG. In this study we described the synthetic process of polymerizable PAGs and the polymerization process to make PAG-bound polymers and then, the lithography properties of resists composed of PAG-bound polymer were reffed to.