Data analysis for photolithography

This paper will propose standard methodologies for analyzing common lithographic data in three areas: photoresist contrast curves, swing curves, and focus-exposure matrices. For each data type, physics-based algebraic equations will be proposed to fit to the data. The equations will be fit to the data using standard non-linear least-squares fitting algorithms with standard statistical tests for removing data flyers and options for weighting the data. Analysis of the resulting curve fits will provide important information about the data.