EBM-5000: electron-beam mask writer for 45-nm node
暂无分享,去创建一个
Takashi Kamikubo | Noriaki Nakayamada | Hirohito Anze | Yoji Ogawa | Shuichi Tamamushi | Hitoshi Sunaoshi | Yuichi Tachikawa | Hitoshi Higurashi | Tomohiro Iijima | Junichi Suzuki | Kenji Ohtoshi | Takehiko Katsumata | Shigehiro Hara
[1] Jun Takamatsu,et al. Eddy current evaluation for a high-resolution EB system , 2001, SPIE Photomask Technology.
[2] Hiroaki Suzuki,et al. Advanced electron-beam writing system EX-11 for next-generation mask fabrication , 1999, Photomask and Next Generation Lithography Mask Technology.
[3] Munehiro Ogasawara,et al. Mechanical system construction for the EX-11 electron beam mask writer: A solution for 100 nm wafer lithography , 2002 .
[4] Munehiro Ogasawara,et al. Development of a fast beam-blanking system , 1998, Photomask and Next Generation Lithography Mask Technology.
[5] Masamitsu Itoh,et al. Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method , 1997 .
[6] Ming L. Yu,et al. Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness , 2005, Photomask Japan.