论文信息 - Chemical and structural modifications in a 193-nm photoresist after low-k dry etch - 字舞流文

Chemical and structural modifications in a 193-nm photoresist after low-k dry etch

A. Franquet | P. Adriaensens | R. Carleer | P. Mertens | G. Vereecke | Q. Le | E. Kesters | M. Lux | Marie-Thérèse Claes | S. Bebelman | M. Frank | J. J. Biebuyk | R. Carleer