Measurement of the absorption cross sections of SiCl_4, SiCl_3, SiCl_2 and Cl at H Lyman-α wavelength

[1]  R. Mével,et al.  A chemical kinetic study of the oxidation of silane by nitrous oxide, nitric oxide and oxygen , 2011 .

[2]  P. Roth,et al.  Elementary kinetics for gas phase combustion of SiCl4 based mixtures , 2011 .

[3]  R. Sivaramakrishnan,et al.  Pyrolysis of C6D5CH3: Rate constants and branching ratios in the high-temperature thermal decomposition of toluene , 2011 .

[4]  R. Mével,et al.  Oxygen atom kinetics in silane–hydrogen–nitrous oxide mixtures behind reflected shock waves , 2010 .

[5]  R. Mével,et al.  A study of N2O decomposition rate constant at high temperature: Application to the reduction of nitrous oxide by hydrogen , 2009 .

[6]  W. Green,et al.  Temperature-dependent kinetics of the vinyl radical (C2H3) self-reaction. , 2009, The journal of physical chemistry. A.

[7]  William A. Goddard,et al.  Silicon nanowires as efficient thermoelectric materials , 2008, Nature.

[8]  S. Ali.  Gas phase vacuum-ultraviolet (vuv) spectroscopy of small halogenated polyatomic molecules , 2007 .

[9]  L. Martin,et al.  Measurements and modeling of SiCl4 combustion in a low-pressure H2/O2 flame , 2006 .

[10]  F. Menzel,et al.  The Combustion of SiCl4 in Hot O2/H2 Flames , 2003 .

[11]  C. Paillard,et al.  Elementary reaction kinetics studies of interest in H2 supersonic combustion chemistry , 2003 .

[12]  K. Bhaskaran,et al.  The shock tube as wave reactor for kinetic studies and material systems , 2002 .

[13]  P. Roth,et al.  High‐temperature kinetics of some Si‐ and Cl‐containing ceramic precursors , 2001 .

[14]  Hans-Robert Volpp,et al.  Absorption cross-sections for some atmospherically important molecules at the H atom Lyman-α wavelength (121.567 nm) , 2001 .

[15]  L. Krasnoperov,et al.  UV Absorption Spectrum and Rate Constant for Self-Reaction of Silyl Radicals , 2001 .

[16]  P. Roth,et al.  High temperature reaction of Sn(3P0) atoms with O2 based on Sn- and O-concentration measurements , 2001 .

[17]  K. Jug,et al.  The Formation of a Solid from the Reaction SiCl4(g) + O2(g) → SiO2(s) + 2Cl2(g) , 2000 .

[18]  C. Paillard,et al.  Rate constant for the reaction of O with H2 at high temperature by resonance absorption measurements of O atoms , 2000 .

[19]  P. Roth,et al.  Laser Flash Photolysis of SiCl4 at High Temperatures Based on Si- and Cl-Concentration Measurements , 1999 .

[20]  J. Halpern,et al.  The vinyl radical (Ã2A″←X̃2A′) spectrum between 530 and 415 nm measured by cavity ring-down spectroscopy , 1999 .

[21]  P. Roth,et al.  Shock Tube Study of the Reaction of Si Atoms with SiCl4 , 1998 .

[22]  P. Roth,et al.  Dissociation of SiCl4 based on Cl- and Si-concentration measurements , 1998 .

[23]  A. Hiraya,et al.  Photoabsorption and fluorescence cross sections of SiCl4 in the region of 6.2–31 eV , 1997 .

[24]  P. Roth,et al.  A SHOCK TUBE STUDY OF THE REACTION OF H ATOMS WITH SICL4 , 1997 .

[25]  P. Roth,et al.  Kinetics of the initiation step of the thermal decomposition of SiCl4 , 1997 .

[26]  C. E. Brion,et al.  Absolute oscillator strengths for the photoabsorption of silane in the valence and Si 2p and 2s regions (7.5–350 eV) , 1995 .

[27]  P. Roth,et al.  A Shock Tube Study of the Thermal Decomposition of Si2H6 Based on Si and SiH2 Measurements , 1995 .

[28]  Ken'ichiro Tanaka,et al.  Photoabsorption, photoionization, and neutral‐dissociation cross sections of SiF4, SiCl4, and Si(CH3)4 in the extreme‐ultraviolet range , 1993 .

[29]  P. Roth,et al.  High-temperature kinetics of Si atom oxidation by NO based on Si, N, and O atom measurements , 1993 .

[30]  H. D. Lin,et al.  Formation of particles in a H2O2 counterflow diffusion flame doped with SiH4 or SiCl4 , 1991 .

[31]  R. Gordon,et al.  Kinetic Modeling of the Chemical Vapor Deposition of Silicon Dioxide from Silane or Disilane and Nitrous Oxide , 1990 .

[32]  R. Gordon,et al.  A kinetics study of the atmospheric pressure CVD reaction of silane and nitrous oxide , 1989 .

[33]  Yasutake Toyoshima,et al.  Vacuum ultraviolet absorption cross sections of SiH4, GeH4, Si2H6, and Si3H8 , 1986 .

[34]  M. Suto,et al.  Quantitative photoexcitation study of SiH4 in vacuum ultraviolet , 1986 .

[35]  A. D. McLean,et al.  Visible electronic absorption spectrum of vinyl radical , 1983 .

[36]  D. Husain,et al.  Kinetic study of reactions of ground state silicon atoms, Si[3p2(3PJ)], by atomic absorption spectroscopy , 1978 .

[37]  B. R. Russell,et al.  The vacuum ultraviolet absorption spectra of the group IVA tetrachlorides , 1977 .