Deposition of Silver Thin Films Using the Pyrazolate Complex [Ag(3,5‐(CF3)2C3HN2)]3

The synthesis and characterization of a series of silver pyrazolate complexes [Ag(tfpz)] 3 (1), [Ag(fbpz)] 3 (2), [Ag(dbpz)] 3 (3), and [(py)Ag(tfpz)] 2 (4) are reported, for which tfpz, fbpz, dbpz are abbreviations for the pyrazolate ligands with formulae 3,5-(CF 3 ) 2 -pz, 3- t Bu-5-(CF 3 )-pz, and 3,5-( t Bu) 2 -pz, respectively. These silver complexes were characterized by microanalysis and spectroscopic methods. The CF 3 -substituted complex 1 possesses the highest volatility and stability against thermal decomposition. Low pressure CVD experiments were conducted over the temperature range 250-350 °C. Silver metal thin films were successfully obtained on silicon wafers using pure H 2 as the carrier gas. Scanning electron microscopy (SEM) was used to reveal surface morphologies, while X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were utilized to determine the atomic composition of the as-deposited thin films as well as the crystallite packing.

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