Tunable-performance all-oxide structure field-effect transistor based atomic layer deposited Hf-doped In2O3 thin films.
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X. Zou | Li Ji | Q. Sun | Shen Hu | Bo Chen | Xiangyu Guo | Xionggang Lu | Jiyuan Zhu | Yu Zhang | Shice Wei | David W Zhang | Shice Wei | D. W. Zhang | Qingqing Sun