Optimization of Jc of YBCO thin films prepared by photo-assisted MOCVD through statistical robust design
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C. Y. Wang | A. Ignatiev | Q. Zhong | K. Abazajian | P. Chou | J. G. Chen | Q. L. Li | E. E. Deal
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C. Y. Wang | A. Ignatiev | Q. Zhong | K. Abazajian | P. Chou | J. G. Chen | Q. L. Li | E. E. Deal