Phase-shifting masks for microlithography: automated design and mask requirements
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[1] James R. Fienup,et al. Phase-retrieval stagnation problems and solutions , 1986 .
[2] A. M. Kowalczyk,et al. Phase Retrieval for a Complex-Valued Object Using a Low-Resolution Image , 1990, Signal Recovery and Synthesis III.
[3] B E Saleh,et al. Simulation of partially coherent imagery in the space and frequency domains and by modal expansion. , 1982, Applied optics.
[4] D. Youla,et al. Image Restoration by the Method of Convex Projections: Part 1ߞTheory , 1982, IEEE Transactions on Medical Imaging.
[5] A. Teolis,et al. An error measure for dose correction in e‐beam nanolithography , 1990 .
[6] Avideh Zakhor,et al. Binary and phase shifting mask design for optical lithography , 1992 .
[7] M. Levenson,et al. Improving resolution in photolithography with a phase-shifting mask , 1982, IEEE Transactions on Electron Devices.
[8] E. Wolf. New spectral representation of random sources and of the partially coherent fields that they generate , 1981 .
[9] M. Sezan,et al. Image Restoration by the Method of Convex Projections: Part 2-Applications and Numerical Results , 1982, IEEE Transactions on Medical Imaging.
[10] R. Gerchberg. A practical algorithm for the determination of phase from image and diffraction plane pictures , 1972 .
[11] B E Saleh,et al. Image construction: optimum amplitude and phase masks in photolithography. , 1985, Applied optics.
[12] H. Fukuda,et al. Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks , 1991 .