Optical properties of low band gap GaAs(1−x)Nx layers: Influence of post-growth treatments
暂无分享,去创建一个
[1] Henryk Temkin,et al. Growth of single phase GaAs1−xNx with high nitrogen concentration by metal–organic molecular beam epitaxy , 1997 .
[2] A. Ougazzaden,et al. Metal organic vapor phase epitaxy growth of GaAsN on GaAs using dimethylhydrazine and tertiarybutylarsine , 1997 .
[3] M. Larson,et al. Room temperature continuous-wave photopumped operation of 1.22 /spl mu/m GaInNAs/GaAs single quantum well vertical cavity surface-emitting laser , 1997 .
[4] Shun Sato,et al. Room-Temperature Operation of GaInNAs/GaInP Double-Heterostructure Laser Diodes Grown by Metalorganic Chemical Vapor Deposition , 1997 .
[5] Charles W. Tu,et al. Bowing parameter of the band-gap energy of GaNxAs1−x , 1997 .
[6] Wei,et al. Localization and percolation in semiconductor alloys: GaAsN vs GaAsP. , 1996, Physical review. B, Condensed matter.
[7] D. Wasik,et al. NITROGEN-DIHYDROGEN COMPLEX IN GAP , 1996 .
[8] T. Kitatani,et al. Room-temperature continuous-wave operation of GaInNAs/GaAs laser diode , 1996 .
[9] K. Uomi,et al. Extremely large N content (up to 10%) in GaNAs grown by gas-source molecular beam epitaxy , 1996 .
[10] Wei,et al. Giant and composition-dependent optical bowing coefficient in GaAsN alloys. , 1996, Physical review letters.
[11] Michio Sato. Growth of GaAsN by low-pressure metalorganic chemical vapor deposition using plasma-cracked N2 , 1994 .
[12] Kazuhiko Hosomi,et al. Gas-Source Molecular Beam Epitaxy of GaNxAs1-x Using a N Radical as the N Source , 1994 .
[13] Shiro Sakai,et al. Band Gap Energy and Band Lineup of III-V Alloy Semiconductors Incorporating Nitrogen and Boron , 1993 .
[14] M. Weyers,et al. Growth of GaAsN alloys by low‐pressure metalorganic chemical vapor deposition using plasma‐cracked NH3 , 1993 .
[15] Lionel C. Kimerling,et al. Observation of recombination-enhanced defect reactions in semiconductors , 1974 .