EUV and debris characteristics of a laser-plasma tin-dioxide colloidal target

Characteristics of extreme ultraviolet (EUV) and debris emissions as well as debris reduction have been investigated for a laser-produced plasma (LPP) EUV source by using a colloidal/liquid jet target containing tin dioxide nanoparticles and tin chloride. The amount of deposited debris on a silicon witness plate was determined by a total laser energy irradiated onto a target. Double-pulse laser irradiation was effective for improving the EUV conversion efficiency as a result of plasma regulation. It was, however, not effective for reducing the deposited debris from a colloidal target with nanoparticles. In situ low-temperature heating of the witness plate was effective to reduce the amount of deposited debris. Room-temperature photon processing using an incoherent vacuum ultraviolet excimer lamp at 126 nm deoxidized a deposited tin oxide layer. In addition to these active debris reduction methods, the use of a tin chloride liquid target at a certain concentration passively reduced the amount of deposited debris as a result of production of chlorine atoms that sputtered and/or etched deposition. The EUV CE of more than 1% was observed from a tin chloride target by using double-pulse laser irradiation.