Influence of the Temperature of the Reactor Top Wall on Growth-Processes in Horizontal Movpe Reactors

[1]  M. D. Croon,et al.  Pressure and temperature dependence of Zn incorporation in metalorganic chemical vapour deposition grown GaAs and AlGaAs using diethylzinc as precursor , 1993 .

[2]  M. D. Croon,et al.  Pressure and temperature dependence of silicon doping of GaAs using Si2H6 in metalorganic chemical vapour deposition , 1992 .

[3]  L. J. Giling,et al.  Photoluminescence properties of AlxGa1-xAs and an investigation of a new 1.951 eV transition , 1991 .

[4]  J. Nijenhuis,et al.  The influence of substrate orientation and mis-orientation on the Si-doping of GaAs grown by MOVPE , 1991 .

[5]  D. Croon,et al.  Analytical models for growth by metal organic vapour phase epitaxy: I. Isothermal models , 1990 .

[6]  W. V. Sark,et al.  Analytical models for growth by metal organic vapour phase epitaxy: II. Influence of temperature gradient , 1990 .

[7]  M. D. Croon,et al.  Temperature dependence of silicon doping of GaAs by SiH4 and Si2H6 in atmospheric pressure metalorganic chemical vapour deposition , 1989 .

[8]  Chris R. Kleijn,et al.  Return flows in horizontal MOCVD reactors studied with the use of TiO2 particle injection and numerical calculations , 1989 .

[9]  W. V. Sark,et al.  Temperature‐dependent aluminum incorporation in AlxGa1−xAs layers grown by metalorganic vapor phase epitaxy , 1988 .

[10]  Klavs F. Jensen,et al.  Three‐Dimensional Flow Effects in Silicon CVD in Horizontal Reactors , 1988 .

[11]  Klavs F. Jensen,et al.  Rice-Ramsperger-Kassel-Marcus theoretical prediction of high-pressure Arrhenius parameters by nonlinear regression: application to silane and disilane decomposition , 1987 .

[12]  M. Mashita,et al.  Silicon doping using disilane in low-pressure OMVPE of GaAs , 1987 .

[13]  J. V. D. Ven,et al.  Gas phase depletion and flow dynamics in horizontal MOCVD reactors , 1986 .

[14]  E. Monberg.  Crystal growth of electronic materials: edited by E. Kaldis. North-Holland Publishing Company, Amsterdam (1985), 396 pp. Price: $87.00 ISBN 0-444-86916-0 , 1986 .

[15]  T. L. Ibbs,et al.  Thermal Diffusion in Gases , 1952 .