Oxides and nitrides as alternative plasmonic materials in the optical range
暂无分享,去创建一个
[1] A. Boltasseva,et al. A comparative study of semiconductor-based plasmonic metamaterials , 2011, 1108.1531.
[2] Viktor A. Podolskiy,et al. Transparent conductive oxides: Plasmonic materials for telecom wavelengths , 2011 .
[3] Ceramic plasmonic components for optical metamaterials , 2011, CLEO: 2011 - Laser Science to Photonic Applications.
[4] A. Urbas,et al. Organic materials with negative and controllable electric permittivity , 2011, CLEO: 2011 - Laser Science to Photonic Applications.
[5] David M. Slocum,et al. Funneling light through a subwavelength aperture using epsilon-near-zero materials , 2011, CLEO: 2011 - Laser Science to Photonic Applications.
[6] M. Helm,et al. Near-field examination of perovskite-based superlenses and superlens-enhanced probe-object coupling , 2011, Nature communications.
[7] Harry A. Atwater,et al. Low-Loss Plasmonic Metamaterials , 2011, Science.
[8] A Paul Alivisatos,et al. Localized surface plasmon resonances arising from free carriers in doped quantum dots. , 2011, Nature materials.
[9] T. Sands,et al. Titanium nitride as a plasmonic material for visible wavelengths , 2010, 1011.4896.
[10] Alexandra Boltasseva,et al. Semiconductors for plasmonics and metamaterials , 2010, 1108.1529.
[11] A. Galca,et al. Optical properties of zinc oxide thin films doped with aluminum and lithium , 2010 .
[12] H. Atwater,et al. Unity-order index change in transparent conducting oxides at visible frequencies. , 2010, Nano letters (Print).
[13] Joakim Andersson,et al. On the deactivation of the dopant and electronic structure in reactively sputtered transparent Al-doped ZnO thin films , 2010 .
[14] Vladimir M. Shalaev,et al. Searching for better plasmonic materials , 2009, 0911.2737.
[15] A. Kildishev,et al. Optical black hole: Broadband omnidirectional light absorber , 2009 .
[16] G. Zhu,et al. Engineering of low-loss metal for nanoplasmonic and metamaterials applications , 2009 .
[17] Akio Suzuki,et al. Ultrathin Al-doped transparent conducting zinc oxide films fabricated by pulsed laser deposition , 2008 .
[18] J. Myoung,et al. Effect of the thickness and hydrogen treatment on the properties of Ga-doped ZnO transparent conductive films , 2008 .
[19] K. Ellmer,et al. Carrier transport in polycrystalline ITO and ZnO:Al II: The influence of grain barriers and boundaries , 2008 .
[20] U. Chettiar,et al. The Ag dielectric function in plasmonic metamaterials. , 2008, Optics express.
[21] A. Kildishev,et al. Engineering space for light via transformation optics. , 2007, Optics letters.
[22] Zhaowei Liu,et al. Far-Field Optical Hyperlens Magnifying Sub-Diffraction-Limited Objects , 2007, Science.
[23] T. Miyata,et al. Effect of thickness on the stability of transparent conducting impurity‐doped ZnO thin films in a high humidity environment , 2007 .
[24] Dong-Ho Kim,et al. Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering , 2006 .
[25] David R. Smith,et al. Metamaterial Electromagnetic Cloak at Microwave Frequencies , 2006, Science.
[26] Byung-Teak Lee,et al. Growth and characterization of single crystalline Ga-doped ZnO films using rf magnetron sputtering , 2006 .
[27] N. Fang,et al. SubDiffraction-Limited Optical Imaging with a Silver Superlens , 2005, Science.
[28] Yan-Ru Lin,et al. Heteroepitaxial TiN of Very Low Mosaic Spread on Al2O3 , 2003 .
[29] J. Horwitz,et al. Epitaxial growth of Al-doped ZnO thin films grown by pulsed laser deposition , 2002 .
[30] Hyung Kook Kim,et al. Solid solubility limits of Ga and Al in ZnO , 2002 .
[31] Heung-Jae Cho,et al. Robust ternary metal gate electrodes for dual gate CMOS devices , 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).
[32] Stergios Logothetidis,et al. Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films , 2001 .
[33] Kun Ho Kim,et al. Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering , 1997 .
[34] I. Nakabayashi,et al. Film properties of ZnO:Al prepared by cosputtering of ZnO:Al and either Zn or Al targets , 1997 .
[35] C. Granqvist. Transparent conductive electrodes for electrochromic devices: A review , 1993 .
[36] A. Rockett,et al. Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering , 1985 .
[37] B. O. Seraphin,et al. Optical properties of CVD-coated TiN, ZrN and HfN , 1982 .
[38] R. W. Christy,et al. Optical Constants of the Noble Metals , 1972 .