Fabrication of an UltraLow-Resistance Ohmic Contact to MWCNT–Metal Interconnect Using Graphitic Carbon by Electron Beam-Induced Deposition (EBID)
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A. G. Fedorov | Songkil Kim | A. Fedorov | V. Tsukruk | Songkil Kim | K. Rykaczewski | M. Henry | D. Kulkarni | D. D. Kulkarni | K. Rykaczewski | M. Henry | V. V. Tsukruk | Mathias Henry | Andrei G. Fedorov | Konrad Rykaczewski
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