Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor
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C. Hwang | G. Choi | Sang Young Lee | Sang Woon Lee | J. Han | J. Gatineau | C. Dussarrat
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C. Hwang | G. Choi | Sang Young Lee | Sang Woon Lee | J. Han | J. Gatineau | C. Dussarrat