Fluid and Hybrid Models of Non Equilibrium Discharges
暂无分享,去创建一个
[1] K. Jensen,et al. A Continuum Model of DC and RF Discharges , 1986, IEEE Transactions on Plasma Science.
[2] H. Sawin,et al. Continuum modeling of argon radio frequency glow discharges , 1987 .
[3] M. Elta,et al. A staggered-mesh finite-difference numerical method for solving the transport equations in low pressure RF glow discharges , 1988 .
[4] Boeuf,et al. Transition between different regimes of rf glow discharges. , 1990, Physical review. A, Atomic, molecular, and optical physics.
[5] J. Boeuf,et al. Pseudospark discharges via computer simulation , 1991 .
[6] H. Sawin,et al. Direct calculation of time-periodic states of continuum models of radio-frequency plasmas , 1992 .
[7] H. Sawin,et al. Continuum modeling of radio‐frequency glow discharges. I. Theory and results for electropositive and electronegative gases , 1992 .
[8] M. Kushner,et al. Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model , 1992 .
[9] L. S. Plano,et al. Self‐consistent dc glow‐discharge simulations applied to diamond film deposition reactors , 1992 .
[10] M. Meyyappan,et al. Radio frequency discharge modeling: Moment equations approach , 1993 .
[11] Turner. Collisionless electron heating in an inductively coupled discharge. , 1993, Physical review letters.
[12] Robert J. Hoekstra,et al. Two‐dimensional hybrid model of inductively coupled plasma sources for etching , 1993 .
[13] W. Goedheer,et al. A two‐dimensional fluid model for an argon rf discharge , 1993 .
[14] David B. Graves,et al. The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges , 1994 .
[15] D. J. Economou,et al. Modeling and simulation of glow discharge plasma reactors , 1994 .
[16] Fiala,et al. Two-dimensional, hybrid model of low-pressure glow discharges. , 1994, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[17] J. Boeuf,et al. Plasma particle interactions , 1994 .
[18] Nakano,et al. Simulations of rf glow discharges in SF6 by the relaxation continuum model: Physical structure and function of the narrow-gap reactive-ion etcher. , 1994, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[19] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[20] Robert J. Hoekstra,et al. Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing , 1994 .
[21] T. Rognlien,et al. Two‐dimensional self‐consistent fluid simulation of radio frequency inductive sources , 1994 .
[22] D. Graves,et al. A two-dimensional, axisymmetric model of a magnetized glow discharge plasma , 1994 .
[23] M. Surendra,et al. Detection and modelling of electrode topography effects on particle traps , 1994 .
[24] David B. Graves,et al. A comparison of particle in cell and fluid model simulations of low‐pressure radio frequency discharges , 1994 .
[25] Turner. Pressure heating of electrons in capacitively coupled rf discharges. , 1995, Physical review letters.
[26] D. Graves,et al. Matching an RF sheath model to a bulk plasma model , 1995 .
[27] Martin A. Gundersen,et al. Triggered breakdown in low-pressure hollow cathode (pseudospark) discharges , 1995 .
[28] J. Boeuf,et al. Two-dimensional model of a capacitively coupled rf discharge and comparisons with experiments in the Gaseous Electronics Conference reference reactor. , 1995, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[29] Dennis W. Hewett,et al. Analytic model of power deposition in inductively coupled plasma sources , 1995 .
[30] D. J. Economou,et al. Two-Dimensional Self-Consistent Radio Frequency Plasma Simulations Relevant to the Gaseous Electronics Conference RF Reference Cell , 1995, Journal of research of the National Institute of Standards and Technology.
[31] D. J. Economou,et al. Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor , 1995 .
[32] M. Surendra. Radiofrequency discharge benchmark model comparison , 1995 .
[33] Jean-Luc Dorier. Genèse, croissance et conséquences de particules dans les plasmas en Silane à basse pression et basse température , 1996 .
[34] M. J. Kushner,et al. Guest Editorial: Special Issue on Images in Plasma Science , 1996 .
[35] R. P. Keatch,et al. Book reviewPrinciples of plasma discharges and material processing: M.A. Lieberman and A.J. Lichtenberg, John Wiley, New York, 1994, 572 pp , 1996 .
[36] W. Schwarzenbach,et al. Global visualization of powder trapping in capacitive RF plasmas by two-dimensional laser scattering , 1996 .
[37] J. Margot,et al. The radial structure of a magnetically confined surface‐wave plasma column , 1996 .
[38] M. Turner. Simulation of kinetic effects in inductive discharges , 1996 .
[39] Paul Williams,et al. Plasma Processing of Semiconductors , 1997 .