Narrow-gap semiconductor magnetic-field sensors and applications

Narrow-gap semiconductors have been used for decades in the fabrication of magnetic field sensors, such as magnetoresistors and Hall sensors. Magnetic field sensors are, in turn, used in conjunction with permanent magnets to make contactless potentiometers and rotary encoders. This sensing technology offers the most reliable way to convert a mechanical movement into an electrical signal, and is widespread in automotive applications. Recent developments in the growth of thin epitaxial layers of InAs and InSb on semiinsulating GaAs or InP substrates have resulted in the development of magnetoresistors with excellent sensitivity and operating temperatures up to 285 degrees C. Magnetoresistors and Hall sensors require a very thin active semiconductor region, a high carrier density and a high room-temperature mobility. The best materials are narrow-gap III-V compounds. 2DEG layers in InSb and InAs would be ideally suited for these devices. The accumulation layer at the surface of InAs has been used to make magnetoresistors, Hall sensors and magnetotransistors. n-type doped thin InSb films are used to make magnetoresistors that outperform Si-based Hall sensors, even with integrated amplification. The authors describe device design criteria, materials requirements and a direct comparison of the three types of galvanomagnetic devices, magnetoresistors, Hall sensors and magnetotransistors, made from the same material. They compare the output of different magnetic field sensing technologies, such as Si and GaAs Hall sensors, and NiFe-based magnetoresistors, with InSb magnetoresistors.

[1]  C. M. Thrush,et al.  Growth and characterization of indium antimonide doped with lead telluride , 1992 .

[2]  U. Dibbern,et al.  Magnetic field sensors using the magnetoresistive effect , 1986 .

[3]  Noguchi,et al.  Intrinsic electron accumulation layers on reconstructed clean InAs(100) surfaces. , 1991, Physical review letters.

[4]  D.L. Endsley,et al.  Four-terminal analysis of the Hall generator , 1961, IRE Transactions on Electron Devices.

[5]  C. M. Thrush,et al.  Growth and characterization of indium arsenide thin films , 1991 .

[6]  F. Kuhrt,et al.  Der Geometrieeinfluß auf den Hall-Effekt bei rechteckigen Halbleiterplatten , 1958 .

[7]  G. Hebner Epitaxial growth of InSb on GaAs by metalorganic chemical vapor deposition {au}R. M. ,Biefeld and , 1990 .

[8]  P. Thompson,et al.  Molecular beam epitaxy growth of InSb films on GaAs , 1989 .

[9]  P. Thompson,et al.  Growth and characterisation of InSb/GaAs grown using molecular beam epitaxy , 1990 .

[10]  P. Coleridge,et al.  Silicon atomic plane doping in MBE grown InAs/GaAs , 1991 .

[11]  Towards higher sensitivity of magnetic transducers based on carrier magnetoconcentration , 1983 .

[12]  J. Chyi,et al.  Growth and transport properties of InAs epilayers on GaAs , 1988 .

[13]  R. E. Doezema,et al.  Magnetoconductance study of accumulation layers on n − I n A s , 1981 .

[14]  R. Droopad,et al.  MBE growth and quantum transport measurements of spike-doped InSb and InAs , 1990 .

[15]  Donald T. Morelli,et al.  Two‐dimensional electron gas magnetic field sensors , 1990 .

[16]  H. Wieder,et al.  Electronic profile of n‐InAs on semi‐insulating GaAs , 1978 .

[17]  H. H. Wieder,et al.  Transport coefficients of InAs epilayers , 1974 .

[18]  A. Nathan,et al.  Low-frequency noise in modulation-doped AlAs/GaAs superlattice dual-drain magnetic sensors , 1990 .

[19]  H. Baltes,et al.  Integrated semiconductor magnetic field sensors , 1986, Proceedings of the IEEE.

[20]  D. Tsui Landau-level spectra of conduction electrons at an InAs surface , 1975 .

[21]  P. Bhattacharya,et al.  Molecular‐beam epitaxial growth of high‐quality InSb on InP and GaAs substrates , 1989 .

[22]  J. Lenz A review of magnetic sensors , 1990, Proc. IEEE.

[23]  T. S. Moss,et al.  Handbook on semiconductors , 1980 .