Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach (MOS test structure)
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[1] Robert C. Bolles,et al. Perceptual Organization and Curve Partitioning , 1986, IEEE Transactions on Pattern Analysis and Machine Intelligence.
[2] D. F. Morrison,et al. Multivariate Statistical Methods , 1968 .
[3] Anthony J. Walton,et al. Interpretation of capacitance-voltage curves for process fault diagnosis: a machine-learning expert system approach , 1988, Proceedings of the IEEE International Conference on Microelectronic Test Structures.
[4] Anthony J. Walton,et al. Improved measurements of doping profiles in silicon using CV techniques , 1988 .
[5] Ian Grant McGillivray,et al. Measurement of electrical parameters and trace impurity effects in MOS capacitors , 1987 .
[6] Anthony J. Walton,et al. Automatic measurement of minority carrier lifetimes in silicon for nonuniform doped samples using the Zerbst method , 1987 .
[7] J. R. Brews,et al. Rapid interface parameterization using a single MOS conductance curve , 1983 .
[8] M. Fischler,et al. Perceptual organization and curve partitioning , 1987 .