Thermoelectric Si1−xGex and Ge epitaxial films on Si(001) with controlled composition and strain for group IV element-based thermoelectric generators
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Y. Uraoka | M. Uenuma | N. Mori | T. Ishibe | K. Sawano | T. Taniguchi | Y. Wagatsuma | Yuichiro Yamashita | Y. Nakamura | M. Alam | Ryoya Hosoda