Low Temperature Epitaxy of 3C SiC Using Hexamethyldisilane Precursor on Si <111> Substrates
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D. Kahler | D. Knuteson | A. Berghmans | B. Wagner | S. McLaughlin | M. King | J. Oliver | N. Singh | R. Rai
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D. Kahler | D. Knuteson | A. Berghmans | B. Wagner | S. McLaughlin | M. King | J. Oliver | N. Singh | R. Rai