Summary of the 6th Workshop on Metallization and Interconnection for Crystalline Silicon Solar Cells

Abstract The 6 th Metallization Workshop took place in Constance, Germany on 2 and 3 May 2016. At the workshop the latest progress in the understanding and application of metallization and interconnection was presented. Screen printed metallization continues to dominate. Material and application technologies are constantly further improved, with sub-40 μm fingers with high cell performance and low Ag consumption demonstrated. Cu plating technology is further perfected in anticipation of large scale industrial implementation, with improvements on adhesion and long term reliability. In interconnection, alternatives to the traditional ribbon soldering technology are proposed. Among them, the multi-wires interconnection schemes are shown to have a dramatic impact on metallization design and technology.

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