Optical Properties and Plasmonic Performance of Titanium Nitride
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Nikolaos Kalfagiannis | P. Patsalas | N. Kalfagiannis | Panos Patsalas | Spyros Kassavetis | S. Kassavetis
[1] Kamil Postava,et al. Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry , 2001 .
[2] G. Kamarinos,et al. Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering , 1999 .
[3] D. Cahill,et al. Morphology of epitaxial TiN(001) grown by magnetron sputtering , 1997 .
[4] C. Mitterer,et al. Investigations on the effects of plasma-assisted pre-treatment for plasma-assisted chemical vapour deposition TiN coatings on tool steel , 2004 .
[5] W. Barnes,et al. Surface plasmon subwavelength optics , 2003, Nature.
[6] Yunuen Montelongo,et al. Plasmonic nanoparticle scattering for color holograms , 2014, Proceedings of the National Academy of Sciences.
[7] Mikael Östling,et al. A comparative study of the diffusion barrier properties of TiN and ZrN , 1986 .
[8] D. Depla,et al. Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate , 2009 .
[9] C. Mitterer,et al. The influence of the ion bombardment on the optical properties of TiNx and ZrNx coatings , 1998 .
[10] E. Budke,et al. Decorative hard coatings with improved corrosion resistance , 1999 .
[11] B. Rauschenbach. Formation of compounds by high-flux nitrogen ion implantation in titanium , 1986 .
[12] M. Leskelä,et al. Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method☆ , 1988 .
[13] Igor Zorić,et al. Nanoplasmonic Probes of Catalytic Reactions , 2009, Science.
[14] A. Pelton,et al. Low temperature tempering-induced changes in bulk resistivity, temperature coefficient of resistivity and stress in physically vapor-deposited TiN , 1988 .
[15] Grigorios Matenoglou,et al. Conducting transition metal nitride thin films with tailored cell sizes: The case of δ-TixTa1−xN , 2008 .
[16] A. Kildishev,et al. Refractory Plasmonics with Titanium Nitride: Broadband Metamaterial Absorber , 2014, Advanced materials.
[17] Nicolas Bonod,et al. Plasmonics : from basics to advanced topics , 2012 .
[18] B. Rauschenbach,et al. Microstructural investigations on titanium nitride films formed by medium energy ion beam assisted deposition , 1993 .
[19] J. Narayan,et al. Epitaxial growth of TaN thin films on Si(100) and Si(111) using a TiN buffer layer , 2002 .
[20] D. Roessler,et al. Kramers-Kronig analysis of reflection data , 1965 .
[21] Lon A. Wang,et al. One-shot deep-UV pulsed-laser-induced photomodification of hollow metal nanoparticles for high-density data storage on flexible substrates. , 2010, ACS nano.
[22] H. Holleck. Material selection for hard coatings , 1986 .
[23] Jun Wang,et al. Plasmon resonant excitation in grating-gated AlN barrier transistors at terahertz frequency , 2012 .
[24] R. Kužel,et al. Ion-assisted sputtering of TiN films , 1990 .
[25] C. Charitidis,et al. Electronic properties of binary and ternary, hard and refractory transition metal nitrides , 2010 .
[26] J. Damiano,et al. Size Effects on the Melting Temperature of Silver Nanoparticles: In-Situ TEM Observations , 2009, Microscopy and Microanalysis.
[27] S. Aouadi,et al. Real-time Spectroscopic Ellipsometry Study of Ultrathin Diffusion Barriers for Integrated Circuits , 2004 .
[28] A. Perry,et al. The chemical analysis of TiN films: A round robin experiment , 1987 .
[29] Mark L Brongersma,et al. Hot-electron photodetection with a plasmonic nanostripe antenna. , 2014, Nano letters.
[30] Wei Chen,et al. Plasmonic enhancement of photocurrent in MoS2 field-effect-transistor , 2013 .
[31] S. Maier. Plasmonics: Fundamentals and Applications , 2007 .
[32] M. Wong,et al. Preparation and characterization of AlN/ZrN and AlN/TiN nanolaminate coatings , 2000 .
[33] B. Mishra,et al. Variation of color in titanium and zirconium nitride decorative thin films , 2002 .
[34] A. Perry. A contribution to the study of poisson's ratios and elasticconstants of TiN, ZrN and HfN , 1990 .
[35] S. Mändl,et al. Optical characterization of TiN produced by metal-plasma immersion ion implantation , 2001 .
[36] R. Ningthoujam,et al. Synthesis, electron transport properties of transition metal nitrides and applications , 2015 .
[37] Suhuai Wei,et al. Band structure and fundamental optical transitions in wurtzite AlN , 2003 .
[38] R. Vispute,et al. Characteristics of titanium nitride films grown by pulsed laser deposition , 1996 .
[39] Sbs Stephan Heil,et al. In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition , 2009 .
[40] J. Toudert,et al. Selective Dichroic Patterning by Nanosecond Laser Treatment of Ag Nanostripes , 2011, Advanced materials.
[41] R. V. Van Duyne,et al. Molecular Plasmonics , 2004, Science.
[42] Burke,et al. Generalized Gradient Approximation Made Simple. , 1996, Physical review letters.
[43] S. Lau,et al. Substrate bias dependence of Raman spectra for TiN films deposited by filtered cathodic vacuum arc , 2002 .
[44] F. Mei,et al. Coherent growth and superhardness effect of AlN/TiN nanomultilayers , 2004 .
[45] Vladimir M Shalaev,et al. The Case for Plasmonics , 2010, Science.
[46] S. Y. Teo,et al. The effect of deposition conditions on the properties of TiN thin films prepared by filtered cathodic vacuum-arc technique , 1999 .
[47] Grigorios Matenoglou,et al. Plasma energy and work function of conducting transition metal nitrides for electronic applications , 2009 .
[48] I. Petrov,et al. Microstructure modification of TiN by ion bombardment during reactive sputter deposition , 1989 .
[49] Jean-Jacques Greffet,et al. Plasmonics: From Basics to Advanced Topics , 2012 .
[50] I. Petrov,et al. Epitaxial Sc1−xTixN(001): Optical and electronic transport properties , 2001 .
[51] Harry A. Atwater,et al. Low-Loss Plasmonic Metamaterials , 2011, Science.
[52] Harry A Atwater,et al. Design of nanostructured solar cells using coupled optical and electrical modeling. , 2012, Nano letters.
[53] K. Witt,et al. Evaluation of optical properties of decorative coatings by spectroscopic ellipsometry , 1992 .
[54] M. Fox. Optical Properties of Solids , 2010 .
[55] I. Petrov,et al. Growth, surface morphology, and electrical resistivity of fully strained substoichiometric epitaxial TiNx (0.67⩽x<1.0) layers on MgO(001) , 2004 .
[56] N. Rorsman,et al. Combined TiN- and TaN temperature compensated thin film resistors , 2012 .
[57] R. Sanjinés,et al. Relative orientation of the constituents on the degree of crystallographic coherence in AlN/TiN superlattices , 2006 .
[58] R. Kužel,et al. Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part II. Transition from porous to compact films and microstructural inhomogeneity of the layers , 1995 .
[59] B. O. Seraphin,et al. Optical properties of CVD-coated TiN, ZrN and HfN , 1982 .
[60] Grigorios Matenoglou,et al. Structure, electronic properties and electron energy loss spectra of transition metal nitride films , 2013 .
[61] Emmanuel Kymakis,et al. Nanoparticle-based plasmonic organic photovoltaic devices , 2013 .
[62] R. Wolters,et al. On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films , 2013 .
[63] Marco Lazzarino,et al. Nanoscale chemical mapping using three-dimensional adiabatic compression of surface plasmon polaritons. , 2010, Nature Nanotechnology.
[64] Qiaoqiang Gan,et al. Plasmonic‐Enhanced Organic Photovoltaics: Breaking the 10% Efficiency Barrier , 2013, Advanced materials.
[65] Xiaoming Xie,et al. H‐Doped Black Titania with Very High Solar Absorption and Excellent Photocatalysis Enhanced by Localized Surface Plasmon Resonance , 2013 .
[66] J. Humlíček,et al. Ellipsometry and transport studies of thin-film metal nitrides , 1998 .
[67] S. Logothetidis,et al. Surface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride films , 2004 .
[68] Pierre Berini,et al. Surface plasmon–polariton amplifiers and lasers , 2011, Nature Photonics.
[69] W. Williams,et al. Transition metal carbides, nitrides, and borides for electronic applications , 1997 .
[70] Enric Bertran,et al. Surface reflectivity of TiN thin films measured by spectral ellipsometry , 1991 .
[71] G. V. Chester,et al. Solid State Physics , 2000 .
[72] Harry A Atwater,et al. PlasMOStor: a metal-oxide-Si field effect plasmonic modulator. , 2009, Nano letters.
[73] W. Sproul,et al. Synthesis and characterization of highly textured polycrystalline AlN/TiN superlattice coatings , 1998 .
[74] Xi Wang,et al. Deposition and modification of titanium nitride by ion assisted arc deposition , 1995 .
[75] K. H. Jolliffee. Optical properties of thin solid films , 1954 .
[76] W. Sproul,et al. The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings , 1989 .
[77] M. Brik,et al. First-principles studies of the electronic and elastic properties of metal nitrides XN (X = Sc, Ti, V, Cr, Zr, Nb) , 2012 .
[78] A. Perry,et al. Variations in the reflectance of TiN, ZrN and HfN , 1988 .
[79] C. Stampfl,et al. Electronic structure and physical properties of early transition metal mononitrides: Density-functional theory LDA, GGA, and screened-exchange LDA FLAPW calculations , 2001 .
[80] Y. Zhou,et al. Determination of Complete Melting and Surface Premelting Points of Silver Nanoparticles by Molecular Dynamics Simulation , 2013 .
[81] L. Hultman,et al. Microstructures of TiN films grown by various physical vapour deposition techniques , 1991 .
[82] Johansson,et al. Optical properties of the group-IVB refractory metal compounds. , 1996, Physical review. B, Condensed matter.
[83] Peter Nordlander,et al. Narrowband photodetection in the near-infrared with a plasmon-induced hot electron device , 2013, Nature Communications.
[84] Y. Tse,et al. Diffraction stress analysis in fiber-textured TiN thin films grown by ion-beam sputtering: Application to (001) and mixed (001)+(111) texture , 2004 .
[85] V. Poulek,et al. Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress , 1993 .
[86] K. Choi,et al. A systematic study of the influence of nitrogen in tuning the effective work function of nitrided metal gates , 2005, IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech)..
[87] R. Kužel,et al. Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part I. Problems and methods , 1994 .
[88] Songyou Wang,et al. Optical properties of cubic Ti3N4, Zr3N4, and Hf3N4 , 2006 .
[89] Y. Shimogaki,et al. TiN Films Prepared by Flow Modulation Chemical Vapor Deposition using TiCl4 and NH3 , 2001 .
[90] D. Mckenzie,et al. Production of dense and oriented structures including titanium nitride by energetic condensation from plasmas , 1996 .
[91] H. Randhawa. Hard coatings for decorative applications , 1988 .
[92] R. A. Matula. Electrical resistivity of copper, gold, palladium, and silver , 1979 .
[93] C. Charitidis,et al. Combined electrical and mechanical properties of titanium nitride thin films as metallization materials , 1999 .
[94] L. Hultman,et al. Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition , 1988 .
[95] T. Seong,et al. Effects of annealing on the microstructures and mechanical properties of TiN/AlN nano-multilayer films prepared by ion-beam assisted deposition , 2002 .
[96] I. Petrova,et al. Microstructural evolution during film growth , 2003 .
[97] A. P. Chernyshev. Effect of nanoparticle size on the onset temperature of surface melting , 2009 .
[98] Andrew J. Wilson,et al. Molecular Plasmonics. , 2016, Annual review of analytical chemistry.
[99] C. Wiemer,et al. Determination of chemical composition and its relationship with optical properties of Ti-N and Ti-V-N sputtered thin films , 1994 .
[100] T. Nomura,et al. Formation of cubic-A1N in TiN/A1N superlattice , 1996 .
[101] M. Engelhard,et al. Surface plasmon-driven water reduction: gold nanoparticle size matters. , 2014, Journal of the American Chemical Society.
[102] Y. Tse,et al. Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering , 2006 .
[103] G. Konstantatos,et al. Molecular interfaces for plasmonic hot electron photovoltaics. , 2015, Nanoscale.
[104] H. Atwater,et al. Plasmonics for improved photovoltaic devices. , 2010, Nature materials.
[105] Stergios Logothetidis,et al. Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films , 2001 .
[106] G. Vourlias,et al. Self-assembled plasmonic templates produced by microwave annealing: applications to surface-enhanced Raman scattering , 2015, Nanotechnology.
[107] V. Kravets,et al. Singular phase nano-optics in plasmonic metamaterials for label-free single-molecule detection. , 2013, Nature materials.
[108] LETTER TO THE EDITOR: Microhardness of Ti-N films containing the epsilon -Ti2N phase , 1988 .
[109] J. Garnett,et al. Colours in Metal Glasses and in Metallic Films. , 1904, Proceedings of the Royal Society of London.
[110] P. Komninou,et al. Optical and electrical properties of TiN/n-GaN contacts in correlation with their structural properties , 2003 .
[111] Y. Ikuhara,et al. Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation , 2003 .
[112] I. Alexandrou,et al. In situ spectroscopic ellipsometry to monitor the process of TiNx thin films deposited by reactive sputtering , 1995 .
[113] Jing Liu,et al. Epitaxial superlattices with titanium nitride as a plasmonic component for optical hyperbolic metamaterials , 2014, Proceedings of the National Academy of Sciences.
[114] J. Narayan,et al. Effect of substrate temperature on the microstructural properties of titanium nitride nanowires grown by pulsed laser deposition , 2014 .
[115] W. Sproul,et al. High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system , 1990 .
[116] J. L. Yang,et al. Chemical mapping of a single molecule by plasmon-enhanced Raman scattering , 2013, Nature.
[117] F. Lévy,et al. Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique , 2001 .
[118] F. Huet,et al. The Microstructure of Ti/Al and TiN Ohmic Contacts to Gallium Nitride , 1999 .
[119] E. Gornik,et al. Excitation of surface plasmons on titanium nitride films : determination of the dielectric function , 1994 .
[120] H. Atwater,et al. Plasmoelectric potentials in metal nanostructures , 2014, Science.
[121] P. Martin,et al. Characterization of the Optical Properties and Composition of TiNx Thin Films by Spectroscopic Ellipsometry and X‐ray Photoelectron Spectroscopy , 1996 .
[122] Bo Zhang,et al. A plasmonic chip for biomarker discovery and diagnosis of type 1 diabetes , 2014, Nature Medicine.
[123] E. Janzén,et al. Growth and electronic properties of epitaxial TiN thin films on 3C-SiC(001) and 6H-SiC(0001) substrates by reactive magnetron sputtering , 1996 .
[124] A. Polman,et al. Plasmonics Applied , 2008, Science.
[125] Peter Nordlander,et al. Vivid, full-color aluminum plasmonic pixels , 2014, Proceedings of the National Academy of Sciences.
[126] G. Konstantatos,et al. Nanostructured materials for photon detection. , 2010, Nature nanotechnology.
[127] Structure and electronic properties of conducting, ternary TixTa1−xN films , 2009 .
[128] R. Pecenka,et al. Structural, compositional, optical and colorimetric characterization of TiN-nanoparticles , 2004 .
[129] Jeffrey N. Anker,et al. Biosensing with plasmonic nanosensors. , 2008, Nature materials.
[130] S. Kodambaka,et al. Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth: An ab initio study , 2003 .
[131] Stergios Logothetidis,et al. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films , 2000 .
[132] M. Cortie,et al. Optical properties and plasmon resonances of titanium nitride nanostructures , 2010, Nanotechnology.
[133] G. Abadias,et al. In situ stress evolution during magnetron sputtering of transition metal nitride thin films , 2008 .
[134] T. Alford,et al. Effectiveness of Ti, TiN, Ta, TaN, and W2N as barriers for the integration of low-k dielectric hydrogen silsesquioxane , 2000 .
[135] Alexandra Boltasseva,et al. Oxides and nitrides as alternative plasmonic materials in the optical range [Invited] , 2011 .
[136] E. Ozbay. Plasmonics: Merging Photonics and Electronics at Nanoscale Dimensions , 2006, Science.
[137] J. Pendry,et al. Plasmonic light-harvesting devices over the whole visible spectrum. , 2010, Nano letters.
[138] G. Pavelescu,et al. Influence of deposition parameters on optical properties of titanium nitride thin films , 1995, Other Conferences.
[139] Peter Kroll,et al. Hafnium nitride with thorium phosphide structure: physical properties and an assessment of the Hf-N, Zr-N, and Ti-N phase diagrams at high pressures and temperatures. , 2003, Physical review letters.
[140] W. Münz,et al. Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit , 2010 .
[141] Shanhui Fan,et al. Optimization of non-periodic plasmonic light-trapping layers for thin-film solar cells , 2013, Nature Communications.
[142] M. Evstigneev,et al. Room-temperature fabrication of hard AlN/TiN superlattice coatings by pulsed laser deposition , 2002 .
[143] N. Halas,et al. Nano-optics from sensing to waveguiding , 2007 .
[144] Eugene A. Irene,et al. Handbook of Ellipsometry , 2005 .
[145] T. J. Yang,et al. An optimal quasisuperlattice design to further improve thermal stability of tantalum nitride diffusion barriers , 2000 .
[146] C. Mitterer,et al. The effect of deposition temperature on microstructure and properties of thermal CVD TiN coatings , 2008 .
[147] Eric Eisenbraun,et al. Ultrathin Diffusion Barriers/Liners for Gigascale Copper Metallization , 2000 .
[148] Nasrat A. Raouf,et al. Optical and electrical properties of reactively sputtered TiN, ZrN, and HfN thin films , 1994, Optics & Photonics.
[149] S. Logothetidis,et al. Interface properties and structural evolution of TiN/Si and TiN/GaN heterostructures , 2003 .
[150] S. Vepřek. SURFACE PROCESSES AND RATE-DETERMINING STEPS IN PLASMA-INDUCED CHEMICAL VAPOUR DEPOSITION: TITANIUM NITRIDE, BORON CARBIDE AND SILICON , 1990 .
[151] A. Kildishev,et al. Titanium nitride as a plasmonic material for visible and near-infrared wavelengths , 2012 .
[152] M. Ritala,et al. Atomic Layer Epitaxy Growth of TiN Thin Films from Til4 and NH 3 , 1998 .
[153] Martin Moskovits,et al. An autonomous photosynthetic device in which all charge carriers derive from surface plasmons. , 2013, Nature nanotechnology.
[154] Panagiotis Karagiannidis,et al. Plasmonic silver nanoparticles for improved organic solar cells , 2012 .
[155] Optical encoding by plasmon-based patterning: hard and inorganic materials become photosensitive. , 2012, Nano letters.
[156] Min Gu,et al. Five-dimensional optical recording mediated by surface plasmons in gold nanorods , 2009, Nature.
[157] Christian Mitterer,et al. A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings , 2002 .