Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets

[1]  J. Pelletier,et al.  Multi-dipolar plasmas for uniform processing: physics, design and performance , 2002 .

[2]  Christopher T. Russell,et al.  The solar wind interaction with the Earth's magnetosphere: a tutorial , 2000 .

[3]  M. Brunel,et al.  Distributed electron cyclotron resonance plasma immersion for large area ion implantation (invited) , 1998 .

[4]  Michael A. Lieberman,et al.  From Fermi acceleration to collisionless discharge heating , 1998 .

[5]  J. Pelletier,et al.  Influence of the multipolar magnetic field configuration on the density of distributed electron cyclotron resonance plasmas , 1997 .

[6]  Y. Sakamoto,et al.  A large-area ECR processing plasma , 1996 .

[7]  Y. Yasaka,et al.  Production of large diameter plasma by using multi-annular antenna for electron cyclotron resonance , 1996 .

[8]  J. Pelletier.  8 – Distributed ECR Plasma Sources , 1995 .

[9]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing , 1994 .

[10]  Masayoshi Tanaka,et al.  8” Uniform Electron Cyclotron Resonance Plasma Source Using a Circular TE01 Mode Microwave , 1993 .

[11]  J. Pelletier.  Distributed ECR: Concept, Performances and Perspectives , 1993 .

[12]  M. Moisan,et al.  Microwave discharges : fundamentals and applications , 1993 .

[13]  H. Nishimura,et al.  Processing Uniformity Improvement by Magnetic Field Distribution Control in Electron Cyclotron Resonance Plasma Chamber , 1993 .

[14]  James B. Roberto,et al.  Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion source , 1990 .

[15]  Norman G. Einspruch,et al.  Plasma processing for VLSI , 1984 .