Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25
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Roger H. French | Harry Sewell | Louis Markoya | Diane McCafferty | R. French | Min K. Yang | R. C. Wheland | H. Sewell | S. Peng | D. McCafferty | W. Qiu | M. F. Lemon | L. Markoya | M. Crawford | Min K. Yang | Weiming Qiu | Robert Clayton Wheland | Sheng Peng | Michael Crawford | Michael K. Crawford | M. Yang
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