Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition
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K. Nakahara | D. Yamashita | K. Koga | M. Shiratani | N. Itagaki | G. Uchida | K. Kamataki | Yeonwon Kim | T. Matsunaga | Hidefumi Matsuzaki