论文信息 - EXPANSION OF AMORPHOUS CARBON IN W/C MULTILAYERS AFTER ANNEALING

EXPANSION OF AMORPHOUS CARBON IN W/C MULTILAYERS AFTER ANNEALING

Dynamical optical dispersion theory is employed to analyze the variations of the positions and intensities of x‐ray diffraction peaks from the W/C multilayer. It is confirmed that the thickness of the C layer expands with the annealing temperature and the multilayer remains undamaged until 800 °C. There is an obvious drop of interfacial root mean square (rms) roughness at 600–800 °C.

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