Nonequilibrium Atmospheric Plasma Deposition

This study is a review of plasma enhanced chemical vapor deposition (PECVD) at atmospheric pressure. Sources for coatings over large area are presented. Millimetric torches and microplasmas are next studied for localized PECVD. A specific attention is paid to the way power is dissipated and the consequences it has on the deposition rate and on quality of thin films.

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