Advanced nanoimprint lithography using a graded functional imprinting material tailored for liquid crystal alignment
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Masahito Oh-e | Hiroshi Yokoyama | Hiroyuki Satou | Makoto Yoneya | Jin Seog Gwag | M. Oh-e | H. Yokoyama | M. Yoneya | J. Gwag | Setsuo Itami | H. Satou | S. Itami
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