Challenges for ultra-shallow junction formation technologies beyond the 90 nm node
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N. Acharya | Paul Janis Timans | Silke Paul | W. Lerch | W. Lerch | Jürgen Niess | Zsolt Nenyei | S. Paul | N. Acharya | J. Niess | P.J. Timans | Z. Nenyei
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