MOSFET HF distortion behavior and modeling for RF IC design

High frequency (HF) distortion of MOSFETs has been characterized at different frequencies and bias conditions with a single tone measurement system. The results show that a MOSFET has much higher "low frequency limit" (LFL) than a bipolar transistor with similar critical dimensions, implying that the HF distortion characteristics of MOSFETs operating at a frequency lower than LFL is dictated by its low-frequency behavior. This discovery is useful for designers and modelers to validate the distortion of a MOSFET model for RF application. It has also been found that the second harmonic P/sub out2/ reaches to its minimum as f/sub T/ peaks, due to a similar non-linearity cancellation as in bipolar transistors. Furthermore, the measured data shows fairly "constant" distortion characteristics over a wide range of drain biases as the device operates in the saturation region. Simulation with a BSIM3v3 based sub-circuit model demonstrates that the distortion behavior of MOSFETs can be well predicted by an RF model if it can accurately describe both DC and AC characteristics with proper parameter extraction.

[1]  S. A. Maas,et al.  Intermodulation in heterojunction bipolar transistors , 1991 .

[2]  Yuhua Cheng,et al.  On the high-frequency characteristics of substrate resistance in RF MOSFETs , 2000, IEEE Electron Device Letters.

[3]  S. H. Jen,et al.  Accurate modeling and parameter extraction for MOS transistors valid up to 10 GHz , 1999 .

[4]  R. Gharpurey,et al.  RF MOSFET modeling accounting for distributed substrate and channel resistances with emphasis on the BSIM3v3 SPICE model , 1997, International Electron Devices Meeting. IEDM Technical Digest.

[5]  C. Enz,et al.  MOS transistor modeling for RF IC design , 2000, IEEE Journal of Solid-State Circuits.

[6]  D.B.M. Klaassen,et al.  RF-distortion in deep-submicron CMOS technologies , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

[7]  Yuhua Cheng,et al.  Frequency-dependent resistive and capacitive components in RF MOSFETs , 2001, IEEE Electron Device Letters.

[8]  Yuhua Cheng,et al.  High-frequency small signal AC and noise modeling of MOSFETs for RF IC design , 2002 .

[9]  Zhe Zhang,et al.  BC35: a 0.35 /spl mu/m, 30 GHz production RF BiCMOS technology , 1999, Proceedings of the 1999 Bipolar/BiCMOS Circuits and Technology Meeting (Cat. No.99CH37024).

[10]  Yuhua Cheng MOSFET modeling for RF IC design , 2001 .

[11]  Mau-Chung Frank Chang,et al.  High-frequency application of MOS compact models and their development for scalable RF model libraries , 1998, Proceedings of the IEEE 1998 Custom Integrated Circuits Conference (Cat. No.98CH36143).

[12]  M. Schroter,et al.  Accurate MOS Transistor Modeling and Parameter Extraction Valid up to 10 GHz , 1998, 28th European Solid-State Device Research Conference.

[13]  J.A.M. Geelen,et al.  An improved de-embedding technique for on-wafer high-frequency characterization , 1991, Proceedings of the 1991 Bipolar Circuits and Technology Meeting.

[14]  Norman Scheinberg,et al.  A computer simulation model for simulating distortion in FETresistors , 2000, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[15]  Paul R. Gray,et al.  CMOS RF modeling for GHz communication IC's , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

[16]  M. Schroter,et al.  Compact modeling of high-frequency distortion in silicon integrated bipolar transistors , 2000 .