论文信息 - An efficient chemistry-enhanced CFD model for the investigation of the rate-limiting mechanisms in industrial Chemical Vapor Deposition reactors - 字舞流文

An efficient chemistry-enhanced CFD model for the investigation of the rate-limiting mechanisms in industrial Chemical Vapor Deposition reactors

T. J. Mountziaris | E. D. Koronaki | A. Boudouvis | S. Bordas | C. Czettl | M. Kathrein | G. Pozzetti | Paris Papavasileiou